Splittermuster

Splittermuster (splinter-pattern) was a four-color military camouflage pattern developed by Germany in the late 1920's and was first issued to the Reichswehr in 1931 . It was first printed on the newly designed and issued triangular tent/poncho called the "dreieckszeltbahn". Known in German as Buntfarbenaufdruck (Colorful print) 31 [http://de.wikipedia.org/wiki/Splittertarn] for its year of introduction, splittermuster was issued on a very wide basis to practically all regular military (Wehrmacht) units. The pattern consists of a disruptive pattern of hard-edged wood brown and medium green polygons printed on a light field-grey or tan background. A random pattern of green dashes called raindrops was applied in places to improve the camouflage effect.

For the 1931 proposed and 1932 introduced four-colour camouflage patterns formed splinter the stained color painting 1918 with its sharp corners and its coloration ocher, rust, brown and green the foundation. It was only the triangular tent train, which also as rain and camouflage poncho in the field could be used with the new pattern printed on. In doing so, the zeltbahn, which with both sides showing the same pattern, but the printing was brighter than the other.

Instead of the bright Ockergelb a subdued gray beige tent on the basis of railway, which screen printing processes green and brown scharfeckige irregular patterns during their lifetime. As an innovation for the resulting stained color printing ("splinter Tarn") were also irregularly distributed last, but in a direction dashed lines ("grass") by which the model can also become blurred. These lines were composed in a dark green of the spots in the selected. During the war began from savings reasons so that the printing with different color means to raise cheaper textiles. In addition, many of the least costly two-color option turning abandoned. Significant deviations from the original color patterns were a consequence of these measures.

Equipment in the stained color printing units were issued to the following:

Heeres-Splittermuster 31

The zeltbahn was the only official Army camouflage until 1942 when the Tarnhemd (smock) and Tarnhelmuberzug (helmet cover), both of a lightweight herringbone twill linen. Only one side of each was printed in splittermuster while the other side was left white for snow camouflage.

In April 1942 a Wintertarnanzug suit consisting of a padded jacket, trousers, separate hood and mittens. These were also printed only on one side and were left white on the other side. However, only a small amount of these were produced, a similar set made in mouse grey or field grey were more common.

Many unofficial garments and helmet covers were produced as filed expedient or tailor made, mostly from zeltbahn material. These included versions of the service dress uniform, Parachute jump smocks, field jackets, rucksacks, panzer jacket,. Later materials included rayon.

Luftwaffe-Splittermuster 41

Luftwaffe-Splittermuster 41 is a Luftwaffe version with a smaller splinter and more complicated pattern, from 1941, probably not earlier, led the German Air Force a variant of splittermuster 31, in the literature as "splinter camouflage B". The main difference to 1931 splinter camouflage is that the smaller factions spots. The complexity of these spots is obvious. The pattern was used for the fallschirmjager's parachute smock and Luftwaffe Field Division field jacket to be manufactured. All other material produced with this equipment such as camouflage helmet covers, ammunition bandoliers, grenade bags, and helmet covers. The production of the splinter camouflage B ended in 1944. [Richardson, Francis. (1945). Camouflage Fabrics both Plain and Printed for Military Use by the German SS and German Army. Reprinted in: Borsarello, J.F. (Ed.). (1990?). SS & Wehrmacht Camouflage, ISO Publications; London.] [Daniel Peterson. (1995), Wehrmecht Camouflage Uniforms & Post-War Derivatives. Printed in the UK by The Crowood Press Ltd: Wiltshire]

References

See also

*Flecktarn
*Sumpftarn
*Strichtarn
*MARPAT (Digital pattern)
*Tarnmuster
*Tarnkleidung